DocumentCode
1777340
Title
High performance flexible CMOS SOI FinFETs
Author
Fahad, Hossain ; Sevilla, Galo Torres ; Ghoneim, Mohamed ; Hussain, M.M.
Author_Institution
Integrated Nanotechnol. Lab., King Abdullah Univ. of Sci. & Technol., Thuwal, Saudi Arabia
fYear
2014
fDate
22-25 June 2014
Firstpage
231
Lastpage
232
Abstract
We demonstrate the first ever CMOS compatible soft etch back based high performance flexible CMOS SOI FinFETs. The move from planar to non-planar FinFETs has enabled continued scaling down to the 14 nm technology node. This has been possible due to the reduction in off-state leakage and reduced short channel effects on account of the superior electrostatic charge control of multiple gates. At the same time, flexible electronics is an exciting expansion opportunity for next generation electronics. However, a fully integrated low-cost system will need to maintain ultra-large-scale-integration density, high performance and reliability - same as today´s traditional electronics. Up until recently, this field has been mainly dominated by very weak performance organic electronics enabled by low temperature processes, conducive to low melting point plastics. Now however, we show the world´s highest performing flexible version of 3D FinFET CMOS using a state-of-the-art CMOS compatible fabrication technique for high performance ultra-mobile consumer applications with stylish design.
Keywords
CMOS analogue integrated circuits; MOSFET; elemental semiconductors; etching; flexible electronics; silicon-on-insulator; 3D FinFET CMOS; CMOS compatible fabrication technique; CMOS compatible soft etch back; Si; flexible electronics; fully-integrated low-cost system; high-performance flexible CMOS SOI FinFET; high-performance ultramobile consumer application; low-melting point plastics; low-temperature process; multiple-gate electrostatic charge control; next generation electronics; nonplanar FinFET; off-state leakage reduction; organic electronics; reduced short channel effects; size 14 nm; ultralarge-scale integration density; CMOS integrated circuits; CMOS technology; FinFETs; Flexible electronics; Flexible printed circuits; Logic gates;
fLanguage
English
Publisher
ieee
Conference_Titel
Device Research Conference (DRC), 2014 72nd Annual
Conference_Location
Santa Barbara, CA
Print_ISBN
978-1-4799-5405-6
Type
conf
DOI
10.1109/DRC.2014.6872382
Filename
6872382
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