• DocumentCode
    1777340
  • Title

    High performance flexible CMOS SOI FinFETs

  • Author

    Fahad, Hossain ; Sevilla, Galo Torres ; Ghoneim, Mohamed ; Hussain, M.M.

  • Author_Institution
    Integrated Nanotechnol. Lab., King Abdullah Univ. of Sci. & Technol., Thuwal, Saudi Arabia
  • fYear
    2014
  • fDate
    22-25 June 2014
  • Firstpage
    231
  • Lastpage
    232
  • Abstract
    We demonstrate the first ever CMOS compatible soft etch back based high performance flexible CMOS SOI FinFETs. The move from planar to non-planar FinFETs has enabled continued scaling down to the 14 nm technology node. This has been possible due to the reduction in off-state leakage and reduced short channel effects on account of the superior electrostatic charge control of multiple gates. At the same time, flexible electronics is an exciting expansion opportunity for next generation electronics. However, a fully integrated low-cost system will need to maintain ultra-large-scale-integration density, high performance and reliability - same as today´s traditional electronics. Up until recently, this field has been mainly dominated by very weak performance organic electronics enabled by low temperature processes, conducive to low melting point plastics. Now however, we show the world´s highest performing flexible version of 3D FinFET CMOS using a state-of-the-art CMOS compatible fabrication technique for high performance ultra-mobile consumer applications with stylish design.
  • Keywords
    CMOS analogue integrated circuits; MOSFET; elemental semiconductors; etching; flexible electronics; silicon-on-insulator; 3D FinFET CMOS; CMOS compatible fabrication technique; CMOS compatible soft etch back; Si; flexible electronics; fully-integrated low-cost system; high-performance flexible CMOS SOI FinFET; high-performance ultramobile consumer application; low-melting point plastics; low-temperature process; multiple-gate electrostatic charge control; next generation electronics; nonplanar FinFET; off-state leakage reduction; organic electronics; reduced short channel effects; size 14 nm; ultralarge-scale integration density; CMOS integrated circuits; CMOS technology; FinFETs; Flexible electronics; Flexible printed circuits; Logic gates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Device Research Conference (DRC), 2014 72nd Annual
  • Conference_Location
    Santa Barbara, CA
  • Print_ISBN
    978-1-4799-5405-6
  • Type

    conf

  • DOI
    10.1109/DRC.2014.6872382
  • Filename
    6872382