Title :
Effect of deposition conditions on microstructure of LiPON films obtained by rf magnetron sputtering
Author :
Kovalenko, L. ; V´yunov, O. ; Belous, A. ; Goutenoire, F. ; Gunes, V. ; Bohnke, O.
Author_Institution :
Dept. of Solid State Chem., Vernadskii Inst. of Gen. & Inorg. Chem. NASU, Kiev, Ukraine
Abstract :
Thin conductive amorphous lithium phosphorous oxynitride (LiPON) films were prepared by rf magnetron sputtering in various experimental conditions. rf power, temperature of substrate, pressure of working gas and deposition time were varied. The microstructure of the films has been investigated by scanning electron microscopy and phosphorous mappings. The optimal conditions of reactive sputtering have been determined, which allows the formation of dense, homogeneous, free of cracks, amorphous thin LiPON films, and stable under ambient atmosphere. An ionic conductivity of 3.2·10-6 S·cm-1 at room temperature has been determined by impedance spectroscopy.
Keywords :
electrochemical impedance spectroscopy; ionic conductivity; lithium compounds; phosphorus compounds; scanning electron microscopy; sputter deposition; thin films; LiPON; RF magnetron sputtering; ambient atmosphere; deposition condition effect; impedance spectroscopy; ionic conductivity; microstructural properties; phosphorous mappings; rf power; scanning electron microscopy; substrate temperature; temperature 293 K to 298 K; thin conductive amorphous lithium phosphorous oxynitride films; working gas pressure; Conductivity; Films; Heating; Nitrogen; Radio frequency; Sputtering; Substrates; LiPON films; RF magnetron sputtering; SEM; impedance spectroscopy;
Conference_Titel :
Electronics and Nanotechnology (ELNANO), 2014 IEEE 34th International Conference on
Conference_Location :
Kyiv
Print_ISBN :
978-1-4799-4581-8
DOI :
10.1109/ELNANO.2014.6873952
