DocumentCode :
1779917
Title :
Experiments on spatial emission distribution in an Ar atmospheric pressure plasma jet stream
Author :
Yamada, Y. ; Goto, Tetsu ; Ohyama, Ryu-ichiro
Author_Institution :
Dept. of Electr. & Electron. Eng., Tokai Univ., Hiratsuka, Japan
fYear :
2014
fDate :
19-22 Oct. 2014
Firstpage :
562
Lastpage :
565
Abstract :
Atmospheric pressure plasma is expected to contribute towards continuous treatment and processing speed improvement of surface treatment. Therefore, it is important to know the distribution condition of the radicals in the atmospheric pressure plasma. The knowledge in the distribution condition of the radicals in plasma is useful for future application of this type of plasma. In this work, the radicals of Ar atmospheric pressure plasma had been measured. This atmospheric pressure plasma generating device is constructed with a silica glass pipe partially inserted into a copper pipe which is an electric discharge electrode. The exposed silica glass pipe is covered with a copper foil which acts as a grounding electrode. There is 1 mm distance between the electrodes, and 10 kV, 10 kHz voltage is applied to generate dielectric barrier discharge (DBD). In addition, carrier gas Ar is supplied there so the plasma is generated and streamed from the silica glass pipe to the air. This plasma is diagnosed using emission spectroscopy method. The measurements were done in 3 dimensions where x-axis was the horizontal direction and y-axis was the perpendicular direction from the frontal view of the silica glass pipe. The z-axis was the distance from the edge of the silica glass. From the results of the radical distribution measurement, the spatial emission spectrum of Ar, OH, N2 and O were visualized.
Keywords :
argon; dielectric-barrier discharges; glass; luminescence; plasma diagnostics; plasma jets; plasma materials processing; plasma-wall interactions; surface treatment; Ar; Ar plasma jet stream; SiO2; carrier gas; copper foil; copper pipe; dielectric barrier discharge; electric discharge electrode; emission spectroscopy method; exposed silica glass pipe; frequency 10 kHz; grounding electrode; horizontal direction; perpendicular direction; plasma generating device; pressure 1 atm; radical distribution condition; silica glass edge; spatial emission distribution; spatial emission spectrum; surface treatment; voltage 10 kV; Educational institutions; Gold; Plasma measurements; Plasmas;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electrical Insulation and Dielectric Phenomena (CEIDP), 2014 IEEE Conference on
Conference_Location :
Des Moines, IA
Type :
conf
DOI :
10.1109/CEIDP.2014.6995733
Filename :
6995733
Link To Document :
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