Silicon CMOS compatible transition metal dioxide technology for boosting highly integrated photonic devices with disruptive performance

In this work we will present the objectives and last results of the FP7-ICT-2013-11-619456 SITOGA project. The SITOGA project will address the integration of transition metal dioxides (TMO) materials in silicon photonics and CMOS electronics. TMOs have unique electro-optical properties that will offer unprecedented and novel capabilities to the silicon platform. SITOGA will focus on two disruptive TMO materials, barium titanate (BaTiO₃) and vanadium didioxide (VO₂), for developing advanced photonic integrated devices for a wide range of applications. Innovative integration processes with silicon photonics circuits and CMOS electronics will be developed. The whole technology chain will be validated by two functional demonstrators: a 40 Gbit/s DPSK transceiver and an 8×8 switching matrix with 100 Gbit/s throughput.