• DocumentCode
    1782086
  • Title

    Hybrid silicon photonics using oxide-free bonding and nanostructured effective materials

  • Author

    Benisty, Hadas ; Bougot-Robin, K. ; Hugonin, J.-P. ; Besbes, Mondher ; Pang, C. ; Talneau, A.

  • Author_Institution
    Lab. Charles Fabry, Inst. d´Opt. Grad. Sch., Palaiseau, France
  • fYear
    2014
  • fDate
    6-10 July 2014
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    Oxide-free bonding of indium phosphide epitaxial layers onto silicon-on-insulator (SOI) offers good thermal and electrical contact. These properties are retained if guidance engineering of the resulting stack is performed by nanostructuring the silicon layer to produce a lower effective index layer. We discuss the optical characterization of such a system by a simple prism deviation method for a thin stack, or diffraction to the air for a more multimode stack, adding a superperiod to the nanostructure.
  • Keywords
    III-V semiconductors; bonding processes; elemental semiconductors; indium compounds; integrated optics; nanophotonics; nanostructured materials; semiconductor epitaxial layers; silicon; silicon-on-insulator; InP; Si; diffraction; electrical contact; hybrid silicon photonics; indium phosphide epitaxial layers; multimode stack; nanostructured effective materials; oxide-free bonding; silicon-on-insulator; simple prism deviation method; thermal contact; thin stack; Bonding; Indexes; Indium phosphide; Optical waveguides; Silicon photonics; effective index material; guidance; hybrid silicon photonics; internal light source;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Transparent Optical Networks (ICTON), 2014 16th International Conference on
  • Conference_Location
    Graz
  • Type

    conf

  • DOI
    10.1109/ICTON.2014.6876618
  • Filename
    6876618