DocumentCode :
1782086
Title :
Hybrid silicon photonics using oxide-free bonding and nanostructured effective materials
Author :
Benisty, Hadas ; Bougot-Robin, K. ; Hugonin, J.-P. ; Besbes, Mondher ; Pang, C. ; Talneau, A.
Author_Institution :
Lab. Charles Fabry, Inst. d´Opt. Grad. Sch., Palaiseau, France
fYear :
2014
fDate :
6-10 July 2014
Firstpage :
1
Lastpage :
4
Abstract :
Oxide-free bonding of indium phosphide epitaxial layers onto silicon-on-insulator (SOI) offers good thermal and electrical contact. These properties are retained if guidance engineering of the resulting stack is performed by nanostructuring the silicon layer to produce a lower effective index layer. We discuss the optical characterization of such a system by a simple prism deviation method for a thin stack, or diffraction to the air for a more multimode stack, adding a superperiod to the nanostructure.
Keywords :
III-V semiconductors; bonding processes; elemental semiconductors; indium compounds; integrated optics; nanophotonics; nanostructured materials; semiconductor epitaxial layers; silicon; silicon-on-insulator; InP; Si; diffraction; electrical contact; hybrid silicon photonics; indium phosphide epitaxial layers; multimode stack; nanostructured effective materials; oxide-free bonding; silicon-on-insulator; simple prism deviation method; thermal contact; thin stack; Bonding; Indexes; Indium phosphide; Optical waveguides; Silicon photonics; effective index material; guidance; hybrid silicon photonics; internal light source;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Transparent Optical Networks (ICTON), 2014 16th International Conference on
Conference_Location :
Graz
Type :
conf
DOI :
10.1109/ICTON.2014.6876618
Filename :
6876618
Link To Document :
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