Pulsed laser deposition (PLD) of hafnium oxide thin films

This work contains the experimental investigation of optical properties of HfO₂ (hafnium oxide) thin films grown on quartz and n-type silica substrates by pulsed laser deposition method. Cold pressed powders of hafnium oxide (HfO₂ 98% - Aldrich Chem. Co.) were used as the target for deposition process. The substrates was heated up to temperature in the range between 200 and 500 °C. Optical properties of the films were investigated by transmittance in the ultra-violet, visible and near infrared range and photoluminescence spectroscopy. We measure the photo-luminescence spectra and dynamics of luminescence process. Optical properties are closely related to the structure of the hafnium oxide thin films.