Title :
Development issue in mushroom-like profile fabrication in EBL double step exposure method
Author :
Indykiewicz, K. ; Paszkiewicz, B. ; Szymanski, T. ; Paszkiewicz, R.
Author_Institution :
Fac. of Microsyst. Electron. & Photonics, Wroclaw Univ. of Technol., Wroclaw, Poland
Abstract :
In the paper simple estimation method of development influence on final structures resolution in resist stack is proposed. The importance of analysis of development process in electron beam lithography is shown. Presented issues are enhancements of Monte Carlo simulations of e-beam influence on resists and as coupled calculations should be used in lithography process design. Performed analysis found good confirmations with conducted experiments.
Keywords :
Monte Carlo methods; electron beam lithography; resists; EBL double step exposure; Monte Carlo simulations; electron beam lithography; mushroom-like profile fabrication; resists; Absorption; Electron beams; Fabrication; Lithography; Monte Carlo methods; Resists;
Conference_Titel :
Advanced Semiconductor Devices & Microsystems (ASDAM), 2014 10th International Conference on
Conference_Location :
Smolenice
Print_ISBN :
978-1-4799-5474-2
DOI :
10.1109/ASDAM.2014.6998645
