Title :
Highly sensitive planar-doped GaAsSb-based backward diodes at 170 GHz
Author :
Takahashi, Tatsuro ; Sato, Mitsuhisa ; Nakasha, Yasuhiro ; Shiba, S. ; Hara, Naoya
Author_Institution :
Fujitsu Ltd., Atsugi, Japan
Abstract :
Highly sensitive p-GaAsSb/i-InAlAs/n-InGaAs backward diodes up to 170 GHz were achieved by adopting planar doping in the n-InGaAs layer. The planar doping is effective to control interband tunneling and junction capacitance (Cj) in the diodes. When doping concentration in the n-InGaAs layer was reduced to 1 × 1017 cm-3, backward-diode characteristics were obtained when planar doping was 2 × 1012 cm-2. We achieved an unmatched and matched sensitivity of about 1,000 and 2,257 V/Wusing a relatively large mesa size of 2 × 2 μm2 at 170 GHz.
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; indium compounds; millimetre wave diodes; semiconductor doping; tunnelling; GaAsSb; InAlAs; InGaAs; doping concentration; frequency 170 GHz; highly sensitive planar-doped-based backward diodes; interband tunneling control; junction capacitance; planar doping; Capacitance; Doping; Heterojunctions; Indium phosphide; Sensitivity; Substrates;
Conference_Titel :
Indium Phosphide and Related Materials (IPRM), 26th International Conference on
Conference_Location :
Montpellier
DOI :
10.1109/ICIPRM.2014.6880565