Title :
Thin body GaSb-OI P-mosfets on Si wafers fabricated by direct wafer bonding
Author :
Nishi, Kentaro ; Yokoyama, Masafumi ; Yokoyama, Haruki ; Takenaka, Mitsuru ; Takagi, Shinichi
Author_Institution :
Univ. of Tokyo, Tokyo, Japan
Abstract :
We have demonstrated the operation of thin body GaSb-on-insulator (GaSb-OI) p-MOSFETs on Si wafers fabricated by direct wafer boding (DWB). We have developed a wafer-scale transfer technique for transferring ultrathin GaSb layers to Si wafers. We have found that the hole mobility of the thin body GaSb-OI p-MOSFETs depends on the GaSb thickness and the GaSb channel surface condition.
Keywords :
III-V semiconductors; MOSFET; etching; gallium compounds; hole mobility; silicon; wafer bonding; DWB; GaSb:Si; channel surface; direct wafer bonding; hole mobility; thin body GaSb-on-insulator p-MOSFET; wafer-scale transfer; Aluminum oxide; Fabrication; Logic gates; MOSFET circuits; Nickel; Silicon; Surface treatment; GaSb; MOSFET; on-insulator; wafer bonding;
Conference_Titel :
Indium Phosphide and Related Materials (IPRM), 26th International Conference on
Conference_Location :
Montpellier
DOI :
10.1109/ICIPRM.2014.6880566