• DocumentCode
    17862
  • Title

    Energy Transferred From a Hot Nickel Target During Magnetron Sputtering

  • Author

    Caillard, Amael ; El Mokh, Mariem ; Semmar, N. ; Dussart, Remi ; Lecas, T. ; Thomann, Anne-Lise

  • Author_Institution
    Groupe de Rech. sur l´Energetique des Milieux Ionises, Univ. of Orleans, Orléans, France
  • Volume
    42
  • Issue
    10
  • fYear
    2014
  • fDate
    Oct. 2014
  • Firstpage
    2802
  • Lastpage
    2803
  • Abstract
    The energy influx emanating from a sputtered Nickel target in a magnetron apparatus is studied using an energy flux diagnostic. An image of the Ni target before, during, and after the sputtering process is presented and correlated to the energy flux results. For an input power above 50 W (i.e., ≈10 W/cm2), an abrupt increase of the energy flux is observed. This phenomenon is associated to the emission of visible and IR lights by the target, and to an increase of the sputtering rate.
  • Keywords
    nickel; sputtering; IR light emission; Ni; apparatus; energy flux diagnostics; energy influx; energy transfer; hot nickel target; magnetron apparatus; magnetron sputtering; visible light emission; Magnetic resonance imaging; Nickel; Plasma temperature; Sputtering; Substrates; Temperature measurement; Energy influx; hot target; magnetic transition; magnetron sputtering;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2014.2338742
  • Filename
    6873336
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=17862