Title :
Energy Transferred From a Hot Nickel Target During Magnetron Sputtering
Author :
Caillard, Amael ; El Mokh, Mariem ; Semmar, N. ; Dussart, Remi ; Lecas, T. ; Thomann, Anne-Lise
Author_Institution :
Groupe de Rech. sur l´Energetique des Milieux Ionises, Univ. of Orleans, Orléans, France
Abstract :
The energy influx emanating from a sputtered Nickel target in a magnetron apparatus is studied using an energy flux diagnostic. An image of the Ni target before, during, and after the sputtering process is presented and correlated to the energy flux results. For an input power above 50 W (i.e., ≈10 W/cm2), an abrupt increase of the energy flux is observed. This phenomenon is associated to the emission of visible and IR lights by the target, and to an increase of the sputtering rate.
Keywords :
nickel; sputtering; IR light emission; Ni; apparatus; energy flux diagnostics; energy influx; energy transfer; hot nickel target; magnetron apparatus; magnetron sputtering; visible light emission; Magnetic resonance imaging; Nickel; Plasma temperature; Sputtering; Substrates; Temperature measurement; Energy influx; hot target; magnetic transition; magnetron sputtering;
Journal_Title :
Plasma Science, IEEE Transactions on
DOI :
10.1109/TPS.2014.2338742
