DocumentCode :
1786523
Title :
On-state darin current modeling for grain and grain boundary effect of the polysilicon materials at various temperatures
Author :
Yang Hyung-Jun ; Lee Gae-Hun ; Song Yun-Heub
Author_Institution :
Dept. of Electron. & Comput. Eng., Hanyang Univ., Seoul, South Korea
fYear :
2014
fDate :
19-21 Sept. 2014
Firstpage :
200
Lastpage :
203
Abstract :
We present analytical on-state drain current model of 2-dimensional (2D) planar-type poly-Silicon TFT devices. The effect of grain and grain boundary on the carrier transport of 2D poly-Silicon devices has been studied by simulation (matlab) tool. Especially, we considered physical parameters such as grain length (Lg), grain boundary length (Lgb) and grain boundary trap density (NGB) in order to analyze cell performance of the poly-Silicon materials at various temperature. Thus, we simulated the temperature dependence of the on-state drain current within a wide temperature range from 248 K (-25 °C) to 348 K (75 °C). From these results, we confirmed that grain length and grain boundary trap density significantly effects on-state drain current in poly-Silicon materials.
Keywords :
elemental semiconductors; grain boundaries; semiconductor device models; silicon; thin film transistors; 2D planar-type polysilicon TFT devices; Matlab simulation tool; Si; carrier transport; grain boundary effect; grain boundary trap density; grain length; on-state drain current modeling; polysilicon materials; temperature 248 K to 348 K; two-dimensional planar-type polysilicon TFT devices; Analytical models; Flash memories; Grain boundaries; Silicon; Temperature; Thin film transistors; grain; grain boundary; modeling; on-state current; poly-Silicon TFTs;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Network Infrastructure and Digital Content (IC-NIDC), 2014 4th IEEE International Conference on
Conference_Location :
Beijing
Print_ISBN :
978-1-4799-4736-2
Type :
conf
DOI :
10.1109/ICNIDC.2014.7000293
Filename :
7000293
Link To Document :
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