DocumentCode :
1786793
Title :
Directed Self-Assembly (DSA) Template Pattern Verification
Author :
Zigang Xiao ; Yuelin Du ; Haitong Tian ; Wong, Martin D. F. ; He Yi ; Wong, H.-S Philip ; Hongbo Zhang
Author_Institution :
Univ. of Illinois at Urbana-Champaign, Champaign, IL, USA
fYear :
2014
fDate :
1-5 June 2014
Firstpage :
1
Lastpage :
6
Abstract :
Directed Self-Assembly (DSA) is a promising technique for contacts/vias patterning, where groups of contacts/vias are patterned by guiding templates. As the templates are patterned by traditional lithography, their shapes may vary due to the process variations, which will ultimately affect the contacts/vias even for the same type of template. Due to the complexity of the DSA process, rigorous process simulation is unacceptably slow for full chip verification. This paper formulate several critical problems in DSA verification, and proposes a design automation methodology that consists of a data preparation and a model learning stage. We present a novel DSA model with Point Correspondence and Segment Distance features for robust learning. Following the methodology, we propose an effective machine learning (ML) based method for DSA hotspot detection. The results of our initial experiments have already demonstrated the high-efficiency of our ML-based approach with over 85% detection accuracy. Compared to the minutes or even hours of simulation time in rigorous method, the methodology in this paper validates the research potential along this direction.
Keywords :
data preparation; electronic design automation; learning (artificial intelligence); lithography; self-assembly; vias; DSA hotspot detection; DSA process; ML based method; contacts-vias patterning; data preparation; design automation methodology; detection accuracy; directed self-assembly; full chip verification; guiding templates; lithography; machine learning based method; model learning stage; point correspondence; process variations; segment distance features; template pattern verification; Accuracy; Data models; Feature extraction; Lithography; Shape; Support vector machines; Training; Directed Self-Assembly; Hotspot; Machine Learning; Verification;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design Automation Conference (DAC), 2014 51st ACM/EDAC/IEEE
Conference_Location :
San Francisco, CA
Type :
conf
DOI :
10.1145/2593069.2593125
Filename :
6881382
Link To Document :
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