• DocumentCode
    1786793
  • Title

    Directed Self-Assembly (DSA) Template Pattern Verification

  • Author

    Zigang Xiao ; Yuelin Du ; Haitong Tian ; Wong, Martin D. F. ; He Yi ; Wong, H.-S Philip ; Hongbo Zhang

  • Author_Institution
    Univ. of Illinois at Urbana-Champaign, Champaign, IL, USA
  • fYear
    2014
  • fDate
    1-5 June 2014
  • Firstpage
    1
  • Lastpage
    6
  • Abstract
    Directed Self-Assembly (DSA) is a promising technique for contacts/vias patterning, where groups of contacts/vias are patterned by guiding templates. As the templates are patterned by traditional lithography, their shapes may vary due to the process variations, which will ultimately affect the contacts/vias even for the same type of template. Due to the complexity of the DSA process, rigorous process simulation is unacceptably slow for full chip verification. This paper formulate several critical problems in DSA verification, and proposes a design automation methodology that consists of a data preparation and a model learning stage. We present a novel DSA model with Point Correspondence and Segment Distance features for robust learning. Following the methodology, we propose an effective machine learning (ML) based method for DSA hotspot detection. The results of our initial experiments have already demonstrated the high-efficiency of our ML-based approach with over 85% detection accuracy. Compared to the minutes or even hours of simulation time in rigorous method, the methodology in this paper validates the research potential along this direction.
  • Keywords
    data preparation; electronic design automation; learning (artificial intelligence); lithography; self-assembly; vias; DSA hotspot detection; DSA process; ML based method; contacts-vias patterning; data preparation; design automation methodology; detection accuracy; directed self-assembly; full chip verification; guiding templates; lithography; machine learning based method; model learning stage; point correspondence; process variations; segment distance features; template pattern verification; Accuracy; Data models; Feature extraction; Lithography; Shape; Support vector machines; Training; Directed Self-Assembly; Hotspot; Machine Learning; Verification;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Design Automation Conference (DAC), 2014 51st ACM/EDAC/IEEE
  • Conference_Location
    San Francisco, CA
  • Type

    conf

  • DOI
    10.1145/2593069.2593125
  • Filename
    6881382