Title :
Design and technology co-optimization near single-digit nodes
Author :
Liebmann, Lars W. ; Topaloglu, Rasit O.
Author_Institution :
Semicond. R&D Center, IBM, Hopewell Junction, VA, USA
Abstract :
As we approach single-digit nodes, traditional design for manufacturability is augmented through several methodologies and design paradigms such as design-technology co-optimization (DTCO), systematic yield limiters optimization (SYLO), and design retargeting. We discuss triple-patterning and spacer-based multiple patterning and their design implications as these technologies will be necessary to cruise us to single-digit nodes. With the help of DTCO, there seems to be a clear path to sub-10nm with or without extreme ultra-violet lithography.
Keywords :
design for manufacture; integrated circuit design; lithography; semiconductor technology; design for manufacturability; design retargeting; design-technology cooptimization; near single digit node; spacer based multiple patterning; systematic yield limiters optimization; triple patterning; Color; Layout; Lithography; Metals; Optimization; Semiconductor device modeling; Systematics;
Conference_Titel :
Computer-Aided Design (ICCAD), 2014 IEEE/ACM International Conference on
Conference_Location :
San Jose, CA
DOI :
10.1109/ICCAD.2014.7001409
