HgCdTe surface stabilization by ultrathin native oxide

The work is devoted to investigation and comparison of platinum deposition and vacuum anneal processes in cases of a chemically treated surface and with ultrathin (~ 1 nm) native oxide. The chemical composition and film thickness were measured by X-ray photoelectron spectroscopy (XPS) at different stages of deposition or directly during annealing without exposition of samples to laboratory atmosphere. Deposition of platinum on the oxidized surface results in less chemical composition violation and tellurium diffusion than if without oxide. Also presence of the thin oxide layer significantly increases range of HgCdTe thermal stability.