Title :
FTIR research of protective PECVD coating for electro-optical devices
Author :
Sidorov, Denis I. ; Mushinsky, Sergey S. ; Shevtsov, Denis I. ; Pervadchuk, Vladimir P.
Author_Institution :
Perm Nat. Res. Polytech. Univ., Perm, Russia
fDate :
June 30 2014-July 4 2014
Abstract :
The paper presents results of FTIR analysis of silicon organic thin films prepared by plasma enhanced chemical vapor deposition methods. The films were deposited from hexamethyldisilazane and oxygen mixture. Refractive index and deposition rates were obtained. Dependencies on plasma source power are presented. Possibility to prepare films with variable properties during deposition was demonstrated.
Keywords :
Fourier transform spectra; infrared spectra; optical films; organic compounds; plasma CVD; plasma CVD coatings; protective coatings; refractive index; silicon compounds; thin films; FTIR; deposition rates; electro-optical devices; hexamethyldisilazane; oxygen mixture; plasma enhanced chemical vapor deposition; plasma source power; protective PECVD coating; refractive index; silicon organic thin films; Educational institutions; Films; Plasmas; Silicon; Spectroscopy; Substrates; FTIR; HMDSN; Mode spectroscopy; PECVD; Silicon organic thin films;
Conference_Titel :
Micro/Nanotechnologies and Electron Devices (EDM), 2014 15th International Conference of Young Specialists on
Conference_Location :
Novosibirsk
Print_ISBN :
978-1-4799-4669-3
DOI :
10.1109/EDM.2014.6882485
