DocumentCode :
178862
Title :
When Patches Match -- A Statistical View on Matching under Illumination Variation
Author :
Mester, R. ; Conrad, C.
Author_Institution :
E.E. Dept. (ISY), Linkoping Univ., Linkoping, Sweden
fYear :
2014
fDate :
24-28 Aug. 2014
Firstpage :
4364
Lastpage :
4369
Abstract :
We discuss matching measures (scores and residuals) for comparing image patches under unknown affine photometric (=intensity) transformations. In contrast to existing methods, we derive a fully symmetric matching measure which reflects the fact that both copies of the signal are affected by measurement errors (´noise´), not only one. As it turns out, this evolves into an Eigen system problem, however a simple direct solution for all entities of interest can be given. We strongly advocate for constraining the estimated gain ratio and the estimated mean value offset to realistic ranges, thus preventing the matching scheme from locking into unrealistic correspondences.
Keywords :
affine transforms; image matching; Eigen system problem; estimated mean value offset; fully symmetric matching measure; illumination variation; image patches; matching scheme; measurement errors; unknown affine photometric transformations; Correlation; Displacement measurement; Eigenvalues and eigenfunctions; Hidden Markov models; Lighting; Standards; Vectors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Pattern Recognition (ICPR), 2014 22nd International Conference on
Conference_Location :
Stockholm
ISSN :
1051-4651
Type :
conf
DOI :
10.1109/ICPR.2014.747
Filename :
6977460
Link To Document :
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