Robust prediction of the radiated pattern features with uncertainties in reflectarray design

The analysis of the tolerance effects on the radiated power pattern caused by the fabrication errors in the printing of the microstrip patches of reflectarrays is addressed through a method based on the Interval Analysis and the arithmetic of intervals. The dimensions of the microstrip patches are defined as intervals of values including the tolerance errors and the mathematics of intervals is exploited to compute the upper and lower bounds of the power pattern representing the maximum distortion with respect to the nominal solution. A representative example is reported to validate the proposed approach and show its behavior.