DocumentCode :
1792602
Title :
Surface activated bonding method applied in MEMS pressure sensor with TSV structures
Author :
Zijian Wu ; YingHui Wang ; Jian Cai ; Qian Wang ; Suga, Takashi
Author_Institution :
Inst. of Microelectron., Tsinghua Univ., Beijing, China
fYear :
2014
fDate :
15-16 July 2014
Firstpage :
38
Lastpage :
38
Abstract :
As one of the traditional bonding method, thermo-compression bonding has the problem of process incompatibility and mechanical instability due to the high bonding temperature. Surface activated bonding (SAB) method can solve such problems by a very low bonding temperature. Oxide layer and contaminations for the normal surface are removed by specific method such as FAB treatment or plasma treatment. When two activated surfaces are brought into contact, clean surfaces are bonded together by atomic force. In this paper, the design and the fabrication of pressure sensor chip with TSV structures would be given, and the details of the surface activated bonding would be given. The results of the bonding would be carefully studied. The SAB method would be compared with thermo-compression bonding in some aspects such as bonding strength, bonding interface condition, etc.
Keywords :
atomic forces; microsensors; pressure sensors; tape automated bonding; three-dimensional integrated circuits; FAB treatment; MEMS pressure sensor; SAB method; TSV structures; atomic force; bonding interface condition; bonding strength; clean surfaces; contaminations; normal surface; oxide layer; plasma treatment; surface activated bonding method; thermocompression bonding; very low bonding temperature; Bonding; Plasma temperature; Surface cleaning; Surface contamination; Temperature sensors; Through-silicon vias;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Low Temperature Bonding for 3D Integration (LTB-3D), 2014 4th IEEE International Workshop on
Conference_Location :
Tokyo
Print_ISBN :
978-1-4799-5260-1
Type :
conf
DOI :
10.1109/LTB-3D.2014.6886177
Filename :
6886177
Link To Document :
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