Laser plasma sources of soft X-rays and extreme ultraviolet (EUV) for application in science and technology

Author

Fiedorowicz, H. ; Ul Ahad, Inam ; Bartnik, A. ; Fok, Tomasz ; Jarocki, Roman ; Korczyc, Barbara ; Kostecki, Jerzy ; Szczurek, Anna ; Szczurek, Miroslaw ; Wachulak, Przemyslaw ; Wegrzynski, Lukasz

Author_Institution

Inst. of Optoelectron., Mil. Univ. of Technol., Warsaw, Poland

fYear

2014

fDate

June 30 2014-July 4 2014

Firstpage

1

Lastpage

1

Abstract

Summary form only given: Application of laser plasma sources of soft X-rays and extreme ultraviolet (EUV) developed in our laboratory in various areas of plasma physics, nanotechnology and biomedical engineering are presented. The sources are based on interaction of high-intensity nanosecond laser pulses from commercial Nd:YAG lasers with gas puff targets formed by pulsed injection of gas under high-pressure. The use of a gas puff target instead of a solid target makes possible to generate plasmas emitting soft X-ray and EUV radiation without target debris production.

Keywords

X-ray optics; plasma X-ray sources; plasma light propagation; plasma production by laser; plasma sources; ultraviolet spectra; biomedical engineering; extreme ultraviolet radiation emission; gas puff targets; high-intensity nanosecond laser pulses; laser plasma sources; nanotechnology; neodymium:YAG lasers; soft X-ray radiation emission; Polymers; Silicon; extreme ultraviolet (EUV); laser-matter interaction; laser-produced plasmas; lasers; soft X-rays;

fLanguage

English

Publisher

ieee

Conference_Titel

Laser Optics, 2014 International Conference

Conference_Location

Saint Petersburg

Print_ISBN

978-1-4799-3884-1

Type

conf

DOI

10.1109/LO.2014.6886335

Filename

6886335