Title :
Silicon ridge waveguide directional couplers with improved tolerance to wafer-scale variations
Author :
Mikkelsen, Jared C. ; Sacher, Wesley D. ; Poon, Joyce K. S.
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Toronto, Toronto, ON, Canada
Abstract :
Silicon directional couplers are designed to be tolerant to width, height, coupling gap, and etch depth variations. Improvements in the wafer-scale variation of the splitting ratio are demonstrated in the IMEC Standard Passives process.
Keywords :
elemental semiconductors; integrated optics; optical directional couplers; ridge waveguides; silicon; tolerance analysis; IMEC Standard Passives process; Si; coupling gap; directional couplers; etch depth variations; height; silicon ridge waveguide; splitting ratio; tolerance; wafer-scale variations; width; Couplings; Directional couplers; Optical waveguides; Standards; Strips; Waveguide discontinuities;
Conference_Titel :
Optical Fiber Communications Conference and Exhibition (OFC), 2014
Conference_Location :
San Francisco, CA
Print_ISBN :
978-1-5575-2994-7
DOI :
10.1364/OFC.2014.Th2A.12
