Title :
Delayed interferometer based Si-wire WDM demultiplexers fabricated by phase controllable and productive 300-mm wafer-scale ArF-immersion lithography technology
Author :
Seok-Hwan Jeong ; Shimura, Daisuke ; Simoyama, Takasi ; Horikawa, Tsuyoshi ; Tanaka, Yuichi ; Morito, Ken
Author_Institution :
Photonics Electron. Technol. Res. Assoc. (PETRA), AIST, Tsukuba, Japan
Abstract :
We report good phase controllability and high production yield in Si-wire delayed interferometer-type demultiplexers fabricated by 300-mm wafer-scale ArF-immersion lithography technologies. The results are promising for utilization in high-density WDM interconnects.
Keywords :
demultiplexing equipment; elemental semiconductors; immersion lithography; interferometers; silicon; wavelength division multiplexing; Si; delayed interferometer-based siliicon wire WDM demultiplexers; high-density WDM interconnects; phase controllable wafer-scale ArF-immersion lithography technology; production yield; productive wafer-scale ArF-immersion lithography technology; size 300 mm; Adaptive optics; Lithography; Optical device fabrication; Optical filters; Optical interferometry; Optical waveguides; Wavelength division multiplexing;
Conference_Titel :
Optical Fiber Communications Conference and Exhibition (OFC), 2014
Conference_Location :
San Francisco, CA
Print_ISBN :
978-1-5575-2994-7
DOI :
10.1364/OFC.2014.Th3F.5
