Influence of target-target distance for composition distribution in new facing targets sputtering

Author

Maetani, Takuya ; Nakamitsu, Yutaka ; Sakurai, Junpei ; Hata, Satoshi

Author_Institution

Dept. of Micro-Nano Syst. Eng., Nagoya Univ., Nagoya, Japan

fYear

2014

fDate

10-12 Nov. 2014

Firstpage

1

Lastpage

3

Abstract

Combinatorial New-Facing Targets Sputtering (combi-NFTS) is one of the co-sputtering method applied to the combinatorial method. Combi-NFTS could easily control the composition range by changing the distance from substrate to targets. Furthermore composition gradient is relatively linear comparing to other thin film deposition method. In this paper, the influence of the distance between target and target gives for the composition distribution is investigated. As a result, it was elucidated that composition distribution and gradient increase as the TT distance increase. This is caused by the peak position of amount of deposited sputtering atom on the substrate change by the TT distance.

Keywords

sputter deposition; thin films; combi-NFTS; combinatorial method; cosputtering method; new-facing target sputtering; sputtering atom deposition; target-target distance; thin film deposition; Atomic layer deposition; Atomic measurements; Libraries; Sputtering; Substrates; Zirconium;

fLanguage

English

Publisher

ieee

Conference_Titel

Micro-NanoMechatronics and Human Science (MHS), 2014 International Symposium on

Conference_Location

Nagoya

Print_ISBN

978-1-4799-6678-3

Type

conf

DOI

10.1109/MHS.2014.7006100

Filename

7006100