DocumentCode :
1795935
Title :
Deeply etched silicon circular Bragg reflector optimized for high reflectance, wide bandwidth, and reduced footprint
Author :
Shitao Gao ; Chang-Joon Chae ; Yang Wang ; Skafidas, E.
Author_Institution :
Victoria Res. Lab., Nat. ICT Australia Ltd., Melbourne, VIC, Australia
fYear :
2014
fDate :
6-10 July 2014
Firstpage :
575
Lastpage :
576
Abstract :
We optimized circular Bragg grating reflectors to achieve high reflection (>0.95) over a wide bandwidth (339nm, reflectance higher than 0.8) for TE mode and to reduce footprint just to 10.96 μm2.
Keywords :
Bragg gratings; elemental semiconductors; etching; integrated optics; reflectivity; silicon; Si; TE mode; deeply etched silicon circular Bragg reflector; high reflectance; reduced footprint; wide bandwidth; Bandwidth; Blades; Bragg gratings; Reflection; Reflectivity; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optical Fibre Technology, 2014 OptoElectronics and Communication Conference and Australian Conference on
Conference_Location :
Melbourne, VIC
Type :
conf
Filename :
6888190
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1795935
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