• DocumentCode
    1795935
  • Title

    Deeply etched silicon circular Bragg reflector optimized for high reflectance, wide bandwidth, and reduced footprint

  • Author

    Shitao Gao ; Chang-Joon Chae ; Yang Wang ; Skafidas, E.

  • Author_Institution
    Victoria Res. Lab., Nat. ICT Australia Ltd., Melbourne, VIC, Australia
  • fYear
    2014
  • fDate
    6-10 July 2014
  • Firstpage
    575
  • Lastpage
    576
  • Abstract
    We optimized circular Bragg grating reflectors to achieve high reflection (>0.95) over a wide bandwidth (339nm, reflectance higher than 0.8) for TE mode and to reduce footprint just to 10.96 μm2.
  • Keywords
    Bragg gratings; elemental semiconductors; etching; integrated optics; reflectivity; silicon; Si; TE mode; deeply etched silicon circular Bragg reflector; high reflectance; reduced footprint; wide bandwidth; Bandwidth; Blades; Bragg gratings; Reflection; Reflectivity; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optical Fibre Technology, 2014 OptoElectronics and Communication Conference and Australian Conference on
  • Conference_Location
    Melbourne, VIC
  • Type

    conf

  • Filename
    6888190
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1795935