Title :
Application of a plasma Arc lamp for thermal processing of semiconductor wafers
Author :
Grover, H.S. ; Dawson, F.P. ; Camm, D.M. ; Cressault, Y. ; Lieberer, M.
Author_Institution :
Univ. of Toronto Toronto, Toronto, ON, Canada
Abstract :
This paper describes the application of a vortex water wall high pressure argon lamp for a semiconductor annealing process. Precise control of the radiated power generated by the lamps is required which in turn requires an accurate electro-thermo-optical dynamic model of the lamp and opto-thermal model of the wafer. This paper discusses the modeling of the system comprised of the lamp and wafer.
Keywords :
arc lamps; plasma materials processing; rapid thermal annealing; semiconductor process modelling; thermo-optical effects; electrothermooptical dynamic model; optothermal model; plasma arc lamp; semiconductor annealing process; semiconductor wafers; thermal processing; vortex water wall high pressure argon lamp; Lighting; Mathematical model; Plasma temperature; Semiconductor devices; Temperature measurement; Thermal analysis; lamp modeling; semiconductor annealing; thermal modeling of wafer; vortex stabilized lamp;
Conference_Titel :
Industry Applications Society Annual Meeting, 2014 IEEE
Conference_Location :
Vancouver, BC
DOI :
10.1109/IAS.2014.6978430
