DocumentCode
1803033
Title
Thermal stability of the power SiGe HBT with non-uniform finger length
Author
Dongyue, Jin ; Wanrong, Zhang ; Pei, Shen ; Hongyun, Xie ; Jia, Li ; Junning, Gan ; Lu, Huang ; Ning, Hu ; Yiwen, Huang
Author_Institution
Coll. of Electron. Inf. & Control Eng., Beijing Univ. of Technol., Beijing
Volume
1
fYear
2008
fDate
21-24 April 2008
Firstpage
166
Lastpage
169
Abstract
Abstract-A 20-finger power SiGe heterojunction bipolar transistor (HBT) with non-uniform emitter finger length is fabricated to improve the thermal stability. For comparison, a SiGe HBT with traditional uniform emitter linger length is also fabricated. The thermal resistance (Rth) and the regression loci of two types of HBTs at different biases are measured and compared. Experimental results show that the thermal stability of the HBT with non-uniform emitter finger length is always superior to that of the uniform one over a wide biasing range. The ability to improve Rth is strengthened from low to high collector current. At the same time, the power level for thermal regression is increases by 48.1%. Furthermore, the measurements of two-dimensional temperature profiles in two types of HBTs are performed to directly prove the improvement of the thermal stability and the peak temperature in the device with non-uniform finger length. Because of the decrease in peak temperature and the improvement of thermal stability, power SiGe HBT with non-uniform finer length can operate at higher bias and hence has higher power handling capability.
Keywords
heterojunction bipolar transistors; power transistors; thermal resistance; thermal stability; nonuniform finger length; power HBT; power handling; thermal resistance; thermal stability; Electrical resistance measurement; Fingers; Germanium silicon alloys; Heterojunction bipolar transistors; Length measurement; Performance evaluation; Silicon germanium; Temperature measurement; Thermal resistance; Thermal stability;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave and Millimeter Wave Technology, 2008. ICMMT 2008. International Conference on
Conference_Location
Nanjing
Print_ISBN
978-1-4244-1879-4
Electronic_ISBN
978-1-4244-1880-0
Type
conf
DOI
10.1109/ICMMT.2008.4540331
Filename
4540331
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