Title :
High-efficiency doherty amplifier using GaN HEMT class-F cells for WCDMA applications
Author :
Lee, Yong-Sub ; Mun-Woo ; Jeong, Yoon-Ha
Author_Institution :
Dept. of Electron. & Electr. Eng., Pohang Univ. of Sci. & Technol., Pohang
Abstract :
This paper presents a high-efficiency GaN high electron mobility transistor (HEMT) class-F Doherty amplifier (CFDA) for wide-band code division multiple access (WCDMA) applications. The class-F power amplifiers (PAs) with significant harmonic suppression are used as the carrier and peaking cells. For validations, the class-F PA is designed and implemented with 25-W GaN HEMT at 2.14 GHz. From the measured results for a single tone, the implemented class-F PA shows the peak power-added efficiency (PAE) and drain efficiency of 72.2% and 75.8% with a gain of 13.2 dB at an output power of 43.2 dBm by suppressing harmonic power levels below -55 dBc. For the proposed CFDA, the PAE and drain efficiency of 56.3% and 60.1% is achieved at 39.5 dBm (6-dB back-off power from Psat) for a single tone. For a one-carrier WCDMA signal, the CFDA shows the PAE of 44.9% with an adjacent channel leakage ratio (ACLR) of -22.1 dBc (plusmn2.5 MHz offset) at 36.5 dBm, while an ACLR of -35.4 dBc with the PAE of 39.7% is achieved for the CEDA after linearity optimization.
Keywords :
III-V semiconductors; UHF amplifiers; broadband networks; code division multiple access; gallium compounds; high electron mobility transistors; power harmonic filters; wide band gap semiconductors; wideband amplifiers; GaN; HEMT class-F cells; WCDMA applications; adjacent channel leakage ratio; class-F Doherty amplifier; class-F power amplifiers; drain efficiency; frequency 2.14 GHz; gain 13.2 dB; harmonic suppression; high electron mobility transistor; power 25 W; power-added efficiency; wideband code division multiple access; Broadband amplifiers; Gain measurement; Gallium nitride; HEMTs; Harmonics suppression; MODFETs; Multiaccess communication; Power amplifiers; Power generation; Power measurement;
Conference_Titel :
Microwave and Millimeter Wave Technology, 2008. ICMMT 2008. International Conference on
Conference_Location :
Nanjing
Print_ISBN :
978-1-4244-1879-4
Electronic_ISBN :
978-1-4244-1880-0
DOI :
10.1109/ICMMT.2008.4540359