DocumentCode :
1804689
Title :
Line drawing interpretation: bilateral symmetry
Author :
Nalwa, Vishvjit S.
Author_Institution :
Dept. of Comput. Sci., Stanford Univ., Palo Alto, CA, USA
fYear :
1988
fDate :
14-17 Nov 1988
Firstpage :
1049
Abstract :
Results previously derived by the author (1988) are used to investigate the implications of bilateral symmetry in line drawings. It is shown that the line drawing of an orthographically projected surface of revolution exhibits bilateral symmetry about the projection of its axis of revolution, irrespective of the viewing direction. Further, with only one exception, a bilaterally symmetric line drawing is necessarily the orthographic projection of a local surface of revolution whenever its symmetry axis continue to be the projection of a fixed line in space under perturbation of viewpoint; the axis of revolution is the invariant preimage of the symmetry axis. Various line-drawing cues are detailed which facilitate the deduction of invariant preimages of symmetry axes, and consequently of local surfaces of revolution
Keywords :
pattern recognition; bilateral symmetry; invariant preimages; line drawing; local surface of revolution; orthographically projected surface of revolution; pattern recognition; symmetry axes; Contracts; Geometry; Lamps; Layout; Reflection;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Pattern Recognition, 1988., 9th International Conference on
Conference_Location :
Rome
Print_ISBN :
0-8186-0878-1
Type :
conf
DOI :
10.1109/ICPR.1988.28437
Filename :
28437
Link To Document :
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