DocumentCode
1805970
Title
Intel Ivy Bridge unveiled — The first commercial tri-gate, high-k, metal-gate CPU
Author
James, Dick
Author_Institution
Chipworks, Ottawa, ON, Canada
fYear
2012
fDate
9-12 Sept. 2012
Firstpage
1
Lastpage
4
Abstract
The year 2007 saw the introduction of the first high-k/metal gate (HKMG) devices into the marketplace. This marked the return of metal-gate technology on silicon for the first time since polysilicon gates became ubiquitous in the early 1970s. Intel was the first to use high-k/metal gate in its 45-nm product. Other leading-edge manufacturers have now launched HKMG products in both gate-first and gate-last forms, and now the first 22-nm FinFET products have come onto the market - the Intel Ivy Bridge CPU. Chipworks, as a supplier of competitive intelligence to the semiconductor and electronics industries, monitors the evolution of chip processes as they come into commercial production. Chipworks has obtained samples of this leading-edge part and performed structural analyses to examine the features and manufacturing processes of the device. This paper discusses some of the different features we have seen within the chip, and illustrates the structure of the tri-gate transistors.
Keywords
microprocessor chips; transistors; FinFET; Intel Ivy Bridge CPU; polysilicon gates; size 22 nm; size 45 nm; tri-gate high-k metal-gate CPU; tri-gate transistors; High K dielectric materials; Logic gates; MOS devices; Metals; Silicon; Silicon germanium; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Custom Integrated Circuits Conference (CICC), 2012 IEEE
Conference_Location
San Jose, CA
ISSN
0886-5930
Print_ISBN
978-1-4673-1555-5
Electronic_ISBN
0886-5930
Type
conf
DOI
10.1109/CICC.2012.6330644
Filename
6330644
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