DocumentCode :
1806205
Title :
A patterning technique for superconducting MgB2 films
Author :
Yang, Fashun ; Zhou, Zhangyu ; Ding, Zhao ; Fu, Xinghua
Author_Institution :
Dept. of Electron., Guizhou Univ., Guiyang
Volume :
2
fYear :
2008
fDate :
21-24 April 2008
Firstpage :
595
Lastpage :
596
Abstract :
The precursor boron films were prepared by chemical vapor deposition by using diborane as the boron source, and patterned by using H2O2 solution as the etchant. The films then annealed in Mg vapor in a tantalum crucible. The patterned MgB2 films with high resolution has a transition temperature of 37 K and a critical current density of 1times106 A/cm2.
Keywords :
boron; magnesium compounds; superconducting thin films; MgB2; boron source; chemical vapor deposition; diborane; patterning technique; precursor boron films; superconducting MgB2 films; tantalum crucible; Aluminum oxide; Annealing; Argon; Boron; Chemical vapor deposition; Magnesium compounds; Strips; Substrates; Superconducting films; Superconducting transition temperature; CVD; Magnesium diboride; lithography; patterning; superconducting films;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave and Millimeter Wave Technology, 2008. ICMMT 2008. International Conference on
Conference_Location :
Nanjing
Print_ISBN :
978-1-4244-1879-4
Electronic_ISBN :
978-1-4244-1880-0
Type :
conf
DOI :
10.1109/ICMMT.2008.4540463
Filename :
4540463
Link To Document :
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