Title :
A fully-integrated Ka-band stacked power amplifier in 45nm CMOS SOI technology
Author :
Jing-Hwa Chen ; Helmi, S.R. ; Mohammadi, Soheil
Author_Institution :
Electr. & Comput. Eng., Purdue Univ., West Lafayette, IN, USA
Abstract :
A fully-integrated Ka-band power amplifier (PA) designed with 2 stacked Cascode cells is implemented in 45nm CMOS SOI technology. The stack configuration overcomes the low breakdown voltages of scaled transistors and provides an output impedance close to 50 Ω. At 37 GHz, and when biased at 3.6 V, the PA delivers a saturated output power (PSAT) and a -1dB compressed output power (P1dB) of 20.2 dBm and 14.5 dBm, respectively, with a peak PAE of 11.2%. With a higher supply voltage of 4.4 V (1.1 V across each transistor), the PSAT and P1dB increase to 21.4 dBm (140 mW) and 17.5 dBm, respectively. The stack configuration allows the PA to deliver high output power at mm-wave frequencies despite the fact that each transistor is biased under a low drain-source voltage.
Keywords :
CMOS analogue integrated circuits; MOSFET; electric breakdown; elemental semiconductors; field effect MIMIC; millimetre wave field effect transistors; millimetre wave integrated circuits; millimetre wave power amplifiers; scaling circuits; silicon; silicon-on-insulator; 2 stacked cascode cell; CMOS SOI technology; PA; PAE; Si; breakdown voltage; compressed output power; efficiency 11.2 percent; frequency 37 GHz; fully-integrated Ka-band stacked power amplifier; gain -1 dB; low drain-source voltage; output impedance; power 140 mW; saturated output power; size 45 nm; transistor scaling; voltage 1.1 V; voltage 3.6 V; voltage 4.4 V; CMOS integrated circuits; CMOS technology; Impedance; Power amplifiers; Power generation; Transistors; Voltage measurement; CMOS; Ka-band; SOI; mm-wave frequencies; stacked power amplifier;
Conference_Titel :
Silicon Monolithic Integrated Circuits in RF Systems (SiRF), 2013 IEEE 13th Topical Meeting on
Conference_Location :
Austin, TX
Print_ISBN :
978-1-4673-1552-4
Electronic_ISBN :
978-1-4673-1551-7
DOI :
10.1109/SiRF.2013.6489437