Low-k dielectrics influence on crosstalk: electromagnetic analysis and characterization

Author

Cregut, Corinne ; Le Carval, Gilles ; Chilo, Jean

Author_Institution

PFT-CEM, St Martin d´´Heres, France

fYear

1998

fDate

1-3 Jun 1998

Firstpage

59

Lastpage

61

Abstract

An analysis of the impact of low-k dielectrics on crosstalk is presented. We show that this impact depends on ground geometry and substrate nature (bulk, epitaxial or SOI). This study is based on high frequency characterization of dedicated test structures. These structures are based on theoretical assumptions and are representative of complex circuit configurations

Keywords

crosstalk; dielectric thin films; electromagnetic fields; integrated circuit interconnections; integrated circuit metallisation; integrated circuit testing; permittivity; SOI substrate; bulk substrate; complex circuit configurations; crosstalk; electromagnetic analysis; epitaxial substrate; ground geometry; high frequency characterization; low-k dielectrics; substrate nature; test structures; Circuit testing; Crosstalk; Dielectric materials; Dielectric substrates; Electromagnetic analysis; Frequency; Geometry; Integrated circuit interconnections; Strips; Voltage;

fLanguage

English

Publisher

ieee

Conference_Titel

Interconnect Technology Conference, 1998. Proceedings of the IEEE 1998 International

Conference_Location

San Francisco, CA

Print_ISBN

0-7803-4285-2

Type

conf

DOI

10.1109/IITC.1998.704751

Filename

704751