DocumentCode :
1808316
Title :
Low-k dielectrics influence on crosstalk: electromagnetic analysis and characterization
Author :
Cregut, Corinne ; Le Carval, Gilles ; Chilo, Jean
Author_Institution :
PFT-CEM, St Martin d´´Heres, France
fYear :
1998
fDate :
1-3 Jun 1998
Firstpage :
59
Lastpage :
61
Abstract :
An analysis of the impact of low-k dielectrics on crosstalk is presented. We show that this impact depends on ground geometry and substrate nature (bulk, epitaxial or SOI). This study is based on high frequency characterization of dedicated test structures. These structures are based on theoretical assumptions and are representative of complex circuit configurations
Keywords :
crosstalk; dielectric thin films; electromagnetic fields; integrated circuit interconnections; integrated circuit metallisation; integrated circuit testing; permittivity; SOI substrate; bulk substrate; complex circuit configurations; crosstalk; electromagnetic analysis; epitaxial substrate; ground geometry; high frequency characterization; low-k dielectrics; substrate nature; test structures; Circuit testing; Crosstalk; Dielectric materials; Dielectric substrates; Electromagnetic analysis; Frequency; Geometry; Integrated circuit interconnections; Strips; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Interconnect Technology Conference, 1998. Proceedings of the IEEE 1998 International
Conference_Location :
San Francisco, CA
Print_ISBN :
0-7803-4285-2
Type :
conf
DOI :
10.1109/IITC.1998.704751
Filename :
704751
Link To Document :
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