DocumentCode :
1810348
Title :
Properties of DC-biased plasma antenna
Author :
Chung, Max ; Chen, Wen-Shan ; Yu, Yen-Hao ; Liou, Zong Yao
Author_Institution :
Dept. of Electron. Eng., Southern Taiwan Univ., Tainan
Volume :
3
fYear :
2008
fDate :
21-24 April 2008
Firstpage :
1118
Lastpage :
1120
Abstract :
Plasma antenna is a general terms representing using plasma as a conductive medium to transmit or reflect signals. It has unique properties like low RCS, tunable impedance, and instant on-off capability. Previous plasma antenna uses 500 MHz 100 W RF power to generate a plasma column, which is limited in energy efficiency and bandwidth. We developed DC-biased plasma antenna, which has no operation frequency upper limit and low sustaining power. Signal is coupled to the plasma antenna via capacitive coupling. Plasma antennas of different length were studied, together with variant gas filled. Positive gain can be achieved at frequencies above the plasma characteristics frequency. Some frequencies shows resonance behavior when plasma is present. Impedance shifts slightly with the DC current. Radiation pattern is less uniform than metal antenna. Gain is related to signal power.
Keywords :
UHF antennas; antenna radiation patterns; plasma devices; DC-biased plasma antenna; antenna radiation pattern; capacitive coupling; frequency 500 MHz; plasma characteristics frequency; power 100 W; variant gas filled; Bandwidth; Energy efficiency; Impedance; Plasma properties; Power generation; Radio frequency; Reflector antennas; Resonance; Resonant frequency; Transmitting antennas;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave and Millimeter Wave Technology, 2008. ICMMT 2008. International Conference on
Conference_Location :
Nanjing
Print_ISBN :
978-1-4244-1879-4
Electronic_ISBN :
978-1-4244-1880-0
Type :
conf
DOI :
10.1109/ICMMT.2008.4540621
Filename :
4540621
Link To Document :
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