Title :
Insulator secondary electron emission and surface charge measurements by electron energy spectrometry
Author :
Elizondo, J.M. ; Linder, K. ; Krogh, M. ; Meredith, Kevin
Abstract :
Summary form only given, as follows. The secondary electron emission (SEE) coefficient is strongly dependent on material type due to the fact that secondary electrons come from primary inelastic electron collisions and intrinsic lattice losses, such as plasmon losses. Other macroscopic factors affecting the emission process are related to surface finish, surface coatings, ion implantation, and surface preparation and cleaning procedures. SEE plays a key role in most proposed models for insulator surface flashover development. We have measured total surface electron yield from a number of materials and from similar materials with different surface treatments. The experiments were performed using a DC and a pulsed electron gun with a hemispherical electron energy spectrometer at vacuum levels in the range of 10-8 Torr. Electron spectroscopy reveals substantial difference in total electron yield due to minor changes in surface finish. The results of SEE measurements and the secondary electron energy distribution, using DC and pulsed electron beams, are presented. Another measurement is to characterize insulator surface charge as a function of pulse length, number of pulses, and total electron beam current. Material surface charge characteristics using electron pulses from 100 /spl mu/sec and up to 1 msec are presented. Results indicate radical surface charge behavior between single pulse, repetitive pulse, and DC experiments.
Keywords :
coatings; electron guns; electron spectroscopy; flashover; insulators; ion implantation; losses; secondary electron emission; surface charging; surface cleaning; surface discharges; surface plasmons; surface treatment; 10 to 8 torr; 100 mus to 1 ms; DC electron beams; DC electron gun; DC experiments; cleaning procedures; electron energy spectrometry; electron pulses; electron spectroscopy; emission process; hemispherical electron energy spectrometer; insulator; insulator surface charge; insulator surface flashover development; intrinsic lattice losses; ion implantation; macroscopic factors; material surface charge characteristics; material type; plasmon losses; primary inelastic electron collisions; pulse length; pulsed electron beams; pulsed electron gun; radical surface charge behavior; repetitive pulse experiments; secondary electron emission; secondary electron emission coefficient; secondary electron energy distribution; secondary electrons; single pulse experiments; surface charge measurements; surface coatings; surface finish; surface preparation; surface treatments; total electron beam current; total electron yield; total surface electron yield; vacuum levels; Coatings; Electron beams; Electron emission; Insulation; Lattices; Plasmons; Pulse measurements; Spectroscopy; Surface finishing; Surface treatment;
Conference_Titel :
Pulsed Power Plasma Science, 2001. IEEE Conference Record - Abstracts
Conference_Location :
Las Vegas, NV, USA
Print_ISBN :
0-7803-7141-0
DOI :
10.1109/PPPS.2001.961376