Title :
A novel fractal geometry for harmonic suppression in parallel coupled-line microstrip bandpass filter
Author :
Zarajabad, H. Karimi ; Nikmehr, S.
Author_Institution :
Dept. of Electr. & Comput. Eng., Tabriz Univ., Tabriz
Abstract :
In this paper, we present novel fractal geometry for suppression of second, third and fourth harmonics in parallel coupled-line microstrip bandpass filter (PCLM-BPF). This new fractal geometry is obtained by finding the best shape for fractal generator curve using genetic algorithm. The PCML-BPF design is initiated using a classical methodology and is finalized by modification of the line-edges with the new fractal geometry. Therefore it is easy to design and fabricate this kind of filter. To validate this novel geometry, third-order Butterworth bandpass filter have been designed and fabricated at 2.5 GHz with a 10% fractional bandwidth on RO3003 substrate. The numerical and experimental result of this new geometry, confirms that there is 5 dB more decrease on second, 18 dB on third and equal decrease on forth harmonic compared to Koch fractal geometry and about 45 dB on 2nd, 12 dB on 3rd and 32 dB on 4th in comparison with the conventional filter. Unlike the Koch fractal geometry which increases the magnitude of the third harmonic even than conventional filter our new fractal geometry decreases the magnitude of this harmonic.
Keywords :
Butterworth filters; UHF filters; band-pass filters; coupled circuits; fractals; genetic algorithms; geometry; harmonics suppression; matrix algebra; microstrip circuits; network synthesis; Koch fractal geometry; fractal generator; frequency 2.5 GHz; genetic algorithm; harmonic suppression; parallel coupled-line microstrip bandpass filter; third-order Butterworth bandpass filter; Band pass filters; Bandwidth; Couplings; Fractals; Genetic algorithms; Geometry; Harmonics suppression; Microstrip filters; Power harmonic filters; Shape;
Conference_Titel :
Microwave and Millimeter Wave Technology, 2008. ICMMT 2008. International Conference on
Conference_Location :
Nanjing
Print_ISBN :
978-1-4244-1879-4
Electronic_ISBN :
978-1-4244-1880-0
DOI :
10.1109/ICMMT.2008.4540661