Multiwavelength optical scatterometry of dielectric gratings

Modern scatterometry problems arising in the lithography production of periodic gratings are in the focus of the work. The performance capabilities of a novel theoretical and numerical modeling oriented to these problems are considered. The approach is based on rigorous solutions of 2-D initial boundary value problems of the gratings theory. The quintessence and advantage of the method is the possibility to perform an efficient analysis simultaneously and interactively both for steady state and transient processes of the resonant scattering of electromagnetic waves by the infinite and compact periodic structures.