DocumentCode :
1811801
Title :
Removal of dilute SF/sub 6/ in He by a pulsed corona reactor
Author :
Minamitani, Y. ; Abe, Y. ; Higashiyama, Y.
Author_Institution :
Yamagata Univ., Japan
fYear :
2001
fDate :
17-22 June 2001
Firstpage :
576
Abstract :
Summary form only given. Sulphur hexafluoride (SF/sub 6/) is useful as an insulator of a circuit breaker and as an etcher of semiconductors. Since SF/sub 6/ is one of greenhouse gases, emission of SF/sub 6/ must be limited and reduced. Investigation on removal method of SF/sub 6/ was carried out by using a pulsed corona reactor. An experimental setup is presented. The electrode of the corona reactor is arranged in a co-axial wire-cylinder configuration. The cylindrical tube is used as a cathode electrode and the wire anode electrode is aligned with the center axis of the cylindrical cathode. The concentration of SF/sub 6/ is measured with an absorption spectrometry. The corona reactor and a cell for measurement of SF/sub 6/ absorption in a sample gas are set in a closed gas loop equipped with two buffer chambers. The sample gas flows constantly in closed gas loop. The buffer chambers play a role to fix the concentration of SF/sub 6/ at an inlet of the corona. reactor during one measurement. The sample gas consists of SF/sub 6/ and helium. The pressure of sample gas is 1 atm. The pulsed voltage circuit is a type of capacitor charge transfer.
Keywords :
air pollution control; anodes; cathodes; corona; plasma applications; plasma chemistry; plasma diagnostics; plasma flow; sulphur compounds; 1 atm; 10 s; 400 mW; He; SF/sub 6/; SF/sub 6/-He; absorption spectrometry; buffer chambers; capacitor charge transfer; cathode electrode; center axis; charging voltage; circuit breaker; closed gas loop; co-axial wire-cylinder configuration; concentration; corona reactor; corona. reactor; cylindrical cathode; cylindrical tube; discharge power; discharge repetition rate; electrode; etching; greenhouse gases; insulator; pressure; pulsed corona discharge; pulsed corona reactor; pulsed voltage circuit; removal method; removal rate; resident time; sample gas; sample gas flow; semiconductor; wire anode electrode; Absorption; Cathodes; Circuit breakers; Corona; Electrodes; Etching; Global warming; Inductors; Insulation; Wire;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Pulsed Power Plasma Science, 2001. IEEE Conference Record - Abstracts
Conference_Location :
Las Vegas, NV, USA
Print_ISBN :
0-7803-7141-0
Type :
conf
DOI :
10.1109/PPPS.2001.961414
Filename :
961414
Link To Document :
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