DocumentCode
1812095
Title
Erosion profile optimization in sputtering systems: a singular value decomposition (SVD) approach
Author
Kamali, Jalil
Author_Institution
Intevac Inc., Santa Clara, CA, USA
Volume
3
fYear
1999
fDate
1999
Firstpage
2200
Abstract
Th paper is concerned with the problem of optimum magnet design in plasma-based sputtering systems which are widely used in the thin film industry. We present a relatively simple mathematical model for the sputtering phenomena, formulate the performance optimization as a weighted least squares problem, and solve it using a singular value decomposition approach. The resulting optimum magnet has been in fact fabricated and is already in use
Keywords
least squares approximations; partial differential equations; permanent magnets; singular value decomposition; sputter deposition; erosion profile optimization; optimum magnet design; performance optimization; permanent magnet array; plasma-based sputtering systems; thin film industry; weighted least squares problem; Argon; Atomic layer deposition; Conducting materials; Electrons; Integral equations; Magnetic fields; Magnetic materials; Plasma applications; Singular value decomposition; Sputtering;
fLanguage
English
Publisher
ieee
Conference_Titel
Decision and Control, 1999. Proceedings of the 38th IEEE Conference on
Conference_Location
Phoenix, AZ
ISSN
0191-2216
Print_ISBN
0-7803-5250-5
Type
conf
DOI
10.1109/CDC.1999.831247
Filename
831247
Link To Document