Title :
Influence of carrier lifetime control process in superjunction MOSFET characteristics
Author :
Saito, Wataru ; Ono, Shintaro ; Yamashita, Hiromasa
Author_Institution :
Toshiba Corp. Semicond. & Storage Products Co., Kawasaki, Japan
Abstract :
This paper reports device characteristics of superjunction (SJ) MOSFETs employed with platinum (Pt) doping or electron irradiation processes for high speed recovery operation of the internal body diode. For the inverter application, high speed recovery operation of the internal body diode is necessary. 600 V-class SJ-MOSFETs were fabricated with a lifetime control process. In this paper, the influence of the carrier lifetime control process upon the on-resistance, leakage current and withstanding capability are reported. The lifetime control process modulates the static characteristics, and it is difficult to obtain the high speed operation with trr <; 100 ns maintaining both low on-resistance and low leakage current. However, the withstanding capability is not problematic due to suppressing the carrier concentration by the short lifetime.
Keywords :
carrier lifetime; leakage currents; platinum; power MOSFET; power semiconductor diodes; semiconductor doping; semiconductor junctions; Pt; carrier concentration; carrier lifetime control process; class SJ-MOSFETs; electron irradiation processes; high speed recovery operation; high voltage power-MOSFET; internal body diode; inverter application; low leakage current; low on-resistance; platinum doping; superjunction MOSFET characteristics; superjunction MOSFET device characteristics; voltage 600 V; Charge carrier lifetime; Doping; Leakage currents; MOSFET; Process control; Radiation effects; Semiconductor diodes;
Conference_Titel :
Power Semiconductor Devices & IC's (ISPSD), 2014 IEEE 26th International Symposium on
Conference_Location :
Waikoloa, HI
Print_ISBN :
978-1-4799-2917-7
DOI :
10.1109/ISPSD.2014.6855982