DocumentCode
181317
Title
First assemblies using Deep Trench Termination diodes
Author
Baccar, F. ; Theolier, L. ; Azzopardi, Stephane ; Le Henaff, Francois ; Deletage, Jean-Yves ; Woirgard, Eric
Author_Institution
IMS Lab., Univ. of Bordeaux, Talence, France
fYear
2014
fDate
15-19 June 2014
Firstpage
143
Lastpage
146
Abstract
In this paper, diodes manufactured in 2008, allowing to obtain the first electrical measurements of the Deep Trench Termination (DT2), are analyzed in a reliability purpose. For the first time, assemblies are made using DT2 diodes reported on Direct Bonded Copper (DBC) substrates using silver sintering process in order to confirm the possibility to integrate this technology in future lead-free packaging. Indeed, geometric singularities and different mechanical properties of BenzoCycloButen (BCB) and silicon could weaken the chip. In order to confirm the device electrical stability, passive thermal ageing are achieved. Then, breakdown voltage measurements, optical observations and TCAD-SENTAURUS simulations are investigated in order to provide explanation of the induced phenomenon linked to the aging.
Keywords
ageing; electric breakdown; semiconductor device packaging; semiconductor device reliability; semiconductor diodes; sintering; BCB; BenzoCycloButen; DBC substrates; DT2 diodes; TCAD-SENTAURUS simulations; breakdown voltage measurements; deep trench termination diodes; device electrical stability; direct bonded copper substrates; electrical measurements; geometric singularities; lead-free packaging; optical observations; passive thermal ageing; reliability purpose; silicon; silver sintering process; Aging; Junctions; Microassembly; Silicon; Silver; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Power Semiconductor Devices & IC's (ISPSD), 2014 IEEE 26th International Symposium on
Conference_Location
Waikoloa, HI
ISSN
1943-653X
Print_ISBN
978-1-4799-2917-7
Type
conf
DOI
10.1109/ISPSD.2014.6855996
Filename
6855996
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