• DocumentCode
    1813345
  • Title

    Reflection and dielectric characteristics of TbDyFe thin film for high frequency MEMS sensors and actuators

  • Author

    Zhiqiang, Yang ; Mengchao, Weng

  • Author_Institution
    Vocational & Tech. Coll., Zhejiang Normal Univ., Jinhua
  • Volume
    3
  • fYear
    2008
  • fDate
    21-24 April 2008
  • Firstpage
    1544
  • Lastpage
    1546
  • Abstract
    The femtosecond pump-probe experimental device was designed to investigate reflection and dielectric properties of TbDyFe thin films. Tb0.27Dy0.73Fe2 thin films were prepared by DC magnetron sputtering and the component, surface topography and crystalline property of TbDyFe thin films were measured by scanning electronic microscope (SEM) and atom force microscope (AFM). The extremum of reflectivity change corresponding to the electron thermalization was 100 plusmn 30 fs. Amplitude of extremum reaches its maximum at 160 mW pump fluence and it turns to zero at 0 mW and echo wave was found in reflectivity waveform. Combine with Fresnel reflect formula and K-K transformation, real and imaginary part of the complex dielectric constant was derived and it indicated that the absorption of thin film became greater with the increasing of reflection at surface after 0 ps delay time, but absorption of thin film recover to its initial state after 1 ps.
  • Keywords
    atomic force microscopy; dysprosium alloys; ferromagnetic materials; iron alloys; magnetic thin films; microactuators; microsensors; permittivity; scanning electron microscopy; sputtered coatings; surface topography; terbium alloys; time resolved spectra; DC magnetron sputtering; MEMS actuators; MEMS sensors; Tb0.27Dy0.73Fe2; atom force microscope; complex dielectric constant; crystalline property; dielectric characteristics; femtosecond pump-probe device; reflection characteristics; scanning electronic microscope; surface topography; thin film; Actuators; Atomic force microscopy; Dielectric thin films; Frequency; Micromechanical devices; Reflection; Scanning electron microscopy; Sensor phenomena and characterization; Sputtering; Thin film sensors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave and Millimeter Wave Technology, 2008. ICMMT 2008. International Conference on
  • Conference_Location
    Nanjing
  • Print_ISBN
    978-1-4244-1879-4
  • Electronic_ISBN
    978-1-4244-1880-0
  • Type

    conf

  • DOI
    10.1109/ICMMT.2008.4540744
  • Filename
    4540744