• DocumentCode
    181370
  • Title

    ON-state breakdown mechanism of GaN power HEMTs

  • Author

    Jinhan Zhang ; Sen Huang ; Qi Zhou ; Xinhua Wang ; Ke Wei ; Guoguo Liu ; Yingkui Zheng ; Xiaojuan Chen ; Xinyu Liu ; Zhongjie Yu ; Wanjun Chen ; Bo Zhang

  • Author_Institution
    State Key Lab. of Electron. Thin Films & Integrated Devices, Univ. of Electron. Sci. & Technol. of China, Chengdu, China
  • fYear
    2014
  • fDate
    15-19 June 2014
  • Firstpage
    237
  • Lastpage
    240
  • Abstract
    Temperature-dependent ON-state breakdown (BVON) loci of AlGaN/GaN high-electron-mobility transistors (HEMTs) were experimentally demonstrated for the first time. With gate-current extraction technique, impact ionization was revealed to be responsible for the ON-state breakdown in our device as the HEMTs is marginally turned on. The characteristic electric-field Ei of impact ionization was extracted exhibiting an U-shaped temperature dependence from 40 to -30 oC, with minimum Ei occurs at -10 oC. Such anomalous temperature dependence of Ei together with the kink effect observed in our devices stem from coulomb scattering effect of the acceptor-like traps in AlGaN/GaN heterostructures.
  • Keywords
    III-V semiconductors; aluminium compounds; gallium compounds; ionisation; power HEMT; semiconductor device breakdown; wide band gap semiconductors; AlGaN-GaN; Coulomb scattering effect; U-shaped temperature dependence; acceptor-like traps; characteristic electric-field; gate-current extraction technique; high-electron-mobility transistors; impact ionization; kink effect; power HEMTs; temperature 40 degC to -30 degC; temperature-dependent ON-state breakdown mechanism; Aluminum gallium nitride; Electric breakdown; Gallium nitride; HEMTs; Logic gates; MODFETs; Temperature measurement; AlGaN/GaN HEMTs; ON-state breakdown; acceptor-like traps; coulomb scattering; impact ionization;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Power Semiconductor Devices & IC's (ISPSD), 2014 IEEE 26th International Symposium on
  • Conference_Location
    Waikoloa, HI
  • ISSN
    1943-653X
  • Print_ISBN
    978-1-4799-2917-7
  • Type

    conf

  • DOI
    10.1109/ISPSD.2014.6856020
  • Filename
    6856020