DocumentCode
1814947
Title
Physics-Based Scalable Modeling of GaAs HBTs
Author
Hu, Juntao ; Zampardi, P.J. ; Cismaru, C. ; Kwok, K. ; Yang, Y.
Author_Institution
Skyworks Solutions, Newbury Park
fYear
2007
fDate
Sept. 30 2007-Oct. 2 2007
Firstpage
176
Lastpage
179
Abstract
While physics-based scalable models are commonplace in the Si industry, there has been little work on applying these techniques to III-V HBTs. The diversification of performance requirements for various handset standards presents an excellent opportunity for GaAs to adopt and even improve upon this modeling methodology. In this work we will present the implementation and application of physics-based scalable models to materials from a GaAs HBT manufacturing line. The application of this methodology has greatly reduced the time, effort, and expense of generating HBT models for multiple material structures using a given technology generation.
Keywords
III-V semiconductors; elemental semiconductors; gallium arsenide; heterojunction bipolar transistors; silicon; HBT models; Si industry; handset standards; Circuit synthesis; Doping; Fabrication; Gallium arsenide; Heterojunction bipolar transistors; Inorganic materials; Semiconductor device modeling; Semiconductor diodes; Silicon; Virtual manufacturing;
fLanguage
English
Publisher
ieee
Conference_Titel
Bipolar/BiCMOS Circuits and Technology Meeting, 2007. BCTM '07. IEEE
Conference_Location
Boston, MA
ISSN
1088-9299
Print_ISBN
978-1-4244-1019-4
Electronic_ISBN
1088-9299
Type
conf
DOI
10.1109/BIPOL.2007.4351863
Filename
4351863
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