• DocumentCode
    1814947
  • Title

    Physics-Based Scalable Modeling of GaAs HBTs

  • Author

    Hu, Juntao ; Zampardi, P.J. ; Cismaru, C. ; Kwok, K. ; Yang, Y.

  • Author_Institution
    Skyworks Solutions, Newbury Park
  • fYear
    2007
  • fDate
    Sept. 30 2007-Oct. 2 2007
  • Firstpage
    176
  • Lastpage
    179
  • Abstract
    While physics-based scalable models are commonplace in the Si industry, there has been little work on applying these techniques to III-V HBTs. The diversification of performance requirements for various handset standards presents an excellent opportunity for GaAs to adopt and even improve upon this modeling methodology. In this work we will present the implementation and application of physics-based scalable models to materials from a GaAs HBT manufacturing line. The application of this methodology has greatly reduced the time, effort, and expense of generating HBT models for multiple material structures using a given technology generation.
  • Keywords
    III-V semiconductors; elemental semiconductors; gallium arsenide; heterojunction bipolar transistors; silicon; HBT models; Si industry; handset standards; Circuit synthesis; Doping; Fabrication; Gallium arsenide; Heterojunction bipolar transistors; Inorganic materials; Semiconductor device modeling; Semiconductor diodes; Silicon; Virtual manufacturing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Bipolar/BiCMOS Circuits and Technology Meeting, 2007. BCTM '07. IEEE
  • Conference_Location
    Boston, MA
  • ISSN
    1088-9299
  • Print_ISBN
    978-1-4244-1019-4
  • Electronic_ISBN
    1088-9299
  • Type

    conf

  • DOI
    10.1109/BIPOL.2007.4351863
  • Filename
    4351863