DocumentCode :
1815179
Title :
High robustness PNP-based structure for the ESD protection of high voltage I/Os in an advanced smart power technology
Author :
Renaud, P. ; Gendron, A. ; Bafleur, M. ; Nolhier, N.
Author_Institution :
Freescale Semicond., Toulouse
fYear :
2007
fDate :
Sept. 30 2007-Oct. 2 2007
Firstpage :
226
Lastpage :
229
Abstract :
A new device dedicated to the ESD protection of high voltage I/Os is presented. In addition to the use of specific design guidelines, the concept consists in coupling an open-base lateral PNP with a vertical avalanche diode within the same structure to obtain a non-snapback behavior together with very good Ron capabilities (~1Omega). The protection of high voltage I/Os with a narrow ESD design window ranging from 80 V to 100 V can be implemented in a reduced surface of 151*140 mum2, which represents a state-of-the-art breakthrough.
Keywords :
electrostatic discharge; power system protection; ESD protection; advanced smart power technology; high robustness PNP-based structure; high voltage I-O; nonsnapback behavior; open-base lateral PNP; vertical avalanche diode; voltage 80 V to 100 V; Bipolar transistors; Current density; Electrostatic discharge; Equations; Guidelines; Protection; Robustness; Space charge; Stress; Voltage; ESD protection; High voltage I/Os; PNP bipolar transistor; smart power technology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Bipolar/BiCMOS Circuits and Technology Meeting, 2007. BCTM '07. IEEE
Conference_Location :
Boston, MA
ISSN :
1088-9299
Print_ISBN :
978-1-4244-1019-4
Electronic_ISBN :
1088-9299
Type :
conf
DOI :
10.1109/BIPOL.2007.4351875
Filename :
4351875
Link To Document :
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