DocumentCode :
1816808
Title :
Silicon carbide power MOSFET model and parameter extraction sequence
Author :
McNutt, Ty ; Hefne, Allen ; Mantooth, Alan ; Berning, D. ; Ryu, Sei-Hyung
Author_Institution :
Arkansas Univ., Fayetteville, AR, USA
Volume :
1
fYear :
2003
fDate :
15-19 June 2003
Firstpage :
217
Abstract :
A compact circuit simulator model is used to describe the performance of a 2 kV, 5 A 4-H silicon carbide (SiC) power DiMOSFET and to perform a detailed comparison with the performance of a widely used 400 V, 5 A silicon (Si) power MOSFET. The model´s channel current expressions are unique in that they include the channel regions at the corners of the square or hexagonal cells that turn on at lower gate voltages and the enhanced linear region transconductance due to diffusion in the nonuniformly doped channel. It is shown that the model accurately describes the static and dynamic performance of both the Si and SiC devices and that the diffusion-enhanced channel conductance is essential to describe the SiC DiMOSFET on-state characteristics. The detailed device comparisons reveal that both the on-state performance and switching performance at 25°C are similar between the 400 V Si and 2 kV SiC MOSFETs, with the exception that the SiC device requires twice the gate drive voltage. The main difference between the devices is that the SiC has a five times higher voltage rating. At higher temperatures (above 100°C), the Si device has a severe reduction in conduction capability, whereas the SiC on-resistance is only minimally affected.
Keywords :
diffusion; electric admittance; elemental semiconductors; power MOSFET; semiconductor device models; silicon; silicon compounds; 2 kV; 25 C; 400 V; 5 A; IGBT Model Parameter Extraction Tools; IMPACT; Si; SiC; SiC on-resistance; channel current expressions; conduction capability reduction; diffusion; diffusion-enhanced channel conductance; dynamic performance; enhanced linear region transconductance; hexagonal cells; lower gate voltages; nonuniformly doped channel; parameter extraction sequence; power DiMOSFET; silicon carbide power MOSFET model; silicon power MOSFET; static performance; Capacitance; Circuit simulation; Immune system; MOSFET circuits; Parameter extraction; Power MOSFET; Power system modeling; Silicon carbide; Threshold voltage; Transconductance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Power Electronics Specialist Conference, 2003. PESC '03. 2003 IEEE 34th Annual
ISSN :
0275-9306
Print_ISBN :
0-7803-7754-0
Type :
conf
DOI :
10.1109/PESC.2003.1218298
Filename :
1218298
Link To Document :
بازگشت