• DocumentCode
    1816826
  • Title

    Development of high-power SiC MESFETs for microwave applications

  • Author

    Bai, Song ; Wu, Peng ; Chen, Gang ; Feng, Zhong ; Li, Zheyang ; Lin, Chuan ; Jiang, Youquan ; Chen, Chen ; Shao, Kai

  • Author_Institution
    Nat. Key Lab. of Monolithic Integrated Circuits & Modules, Nanjing Electron. Devices Inst., Nanjing
  • Volume
    4
  • fYear
    2008
  • fDate
    21-24 April 2008
  • Firstpage
    2032
  • Lastpage
    2035
  • Abstract
    SiC MESFETs were fabricated using in-house grown epitaxial structures on semi-insulating 4H-SiC substrates. Field-plate technique was used to enhance power performance. DC and small-signal characteristics were measured for small gate-periphery devices. Packaged 20-mm SiC MESFET transistors were demonstrated with a saturated power 80 W and 44% drain efficiency with the pulsed condition at a duty cycle of 10% and 300 musec pulse width. A SiC MESFET amplifier was developed for S-band operations consisting of internally partial- matched SiC MESFETs. The amplifier delivered a peak power of 280 W under pulsed operation with 8.6 dB power gain at 2 GHz and 65 V drain voltage.
  • Keywords
    Schottky gate field effect transistors; amplifiers; transistors; MESFET amplifier; MESFET transistors; field-plate technique; microwave applications; small gate-periphery devices; MESFETs; Microwave devices; Microwave transistors; Operational amplifiers; Packaging; Power amplifiers; Pulse amplifiers; Silicon carbide; Space vector pulse width modulation; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave and Millimeter Wave Technology, 2008. ICMMT 2008. International Conference on
  • Conference_Location
    Nanjing
  • Print_ISBN
    978-1-4244-1879-4
  • Electronic_ISBN
    978-1-4244-1880-0
  • Type

    conf

  • DOI
    10.1109/ICMMT.2008.4540892
  • Filename
    4540892