DocumentCode :
1817742
Title :
High throughput capability of a microfabricated hollow probe for near field microscopy in ultraviolet region
Author :
Yatsui, T. ; Ueda, M. ; Kourogi, M. ; Ohtsu, M.
Author_Institution :
Ohtsu Project, Japan Sci. & Technol. Corp., Tokyo, Japan
fYear :
2001
fDate :
11-11 May 2001
Firstpage :
79
Lastpage :
80
Abstract :
Summary form only given. For realizing high sensitivity in high spatially resolved spectroscopy in ultraviolet (UV) region, we demonstrate here high throughput capability of a hollow probe fabricated by the transfer mold technique in a pyramidal silicon groove. In comparison with the conventional fiber probe, the advantages of such a probe are: 1. Hollow structure leads to no optical absorption in the UV region inside the probe, which results in high throughput. 2. Hollow structure leads to no luminescence in the UV region inside the probe, which results in high signal to noise ratio in the illumination-mode near field spectroscopy.
Keywords :
micro-optics; moulding; optical fabrication; optical microscopy; probes; sensitivity; silicon; ultraviolet spectroscopy; Si; high signal to noise ratio; high throughput capability; illumination-mode near field spectroscopy; microfabricated hollow probe; near field microscopy; pyramidal silicon groove; transfer mold technique; ultraviolet region; Electromagnetic wave absorption; Luminescence; Microscopy; Optical noise; Optical sensors; Probes; Silicon; Spatial resolution; Spectroscopy; Throughput;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Quantum Electronics and Laser Science Conference, 2001. QELS '01. Technical Digest. Summaries of Papers Presented at the
Conference_Location :
Baltimore, MD, USA
Print_ISBN :
1-55752-663-X
Type :
conf
DOI :
10.1109/QELS.2001.961881
Filename :
961881
Link To Document :
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