DocumentCode :
1818338
Title :
Ionization-assisted deposition of alkylacrylate and fluorinated alkylacrylate polymer thin films
Author :
Usui, H. ; Katayama, A. ; Honda, T. ; Tanaka, K.
Author_Institution :
Dept. of Mater. Syst. Eng., Tokyo Univ. of Agric. & Technol., Japan
Volume :
1
fYear :
2003
fDate :
1-5 June 2003
Firstpage :
104
Abstract :
Polymeric thin films were prepared by the ionization-assisted deposition (IAD) from alkylacrylate source materials. Deposition of n-octadecyl acrylate resulted in formation of comb-like acryl polymer having long alkyl side chain. The polymer yield increased with increasing electron emission current for the IAD. For the preparation of fluorinated polymer thin films, 1H,1H,11H-eicosafluoroundecyl acrylate was used as the source material. While no films were obtained by the conventional evaporation method, insoluble thin films were deposited by the IAD. The deposited film had TeflonR-like feature of large water contact angle.
Keywords :
contact angle; electron emission; ion beam assisted deposition; polymer films; wetting; Teflon like properties; alkylacrylate; comb-like acryl polymer; conventional evaporation method; electron emission current; fluorinated alkylacrylate polymer thin films; hydrophobic properties; insoluble thin films; ionization assisted deposition; n-octadecyl acrylate; water contact angle; Acceleration; Agricultural engineering; Chemical vapor deposition; Electrons; Impurities; Microstructure; Polyethylene; Polymer films; Solvents; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Properties and Applications of Dielectric Materials, 2003. Proceedings of the 7th International Conference on
ISSN :
1081-7735
Print_ISBN :
0-7803-7725-7
Type :
conf
DOI :
10.1109/ICPADM.2003.1218363
Filename :
1218363
Link To Document :
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