Grazing incidence mirrors for EUV lithography

Author

Braic, V. ; Balaceanu, M. ; Braic, M.

Author_Institution

Nat. Inst. for Optoelectron., Bucharest

Volume

2

fYear

2008

fDate

13-15 Oct. 2008

Firstpage

267

Lastpage

270

Abstract

Extreme UV lithography is one of the most favoured options for the next generation of lithography systems, being considered as one of the keys of the 50 nm technology node. ZrN/TiN, multi-layered coatings for mirrors with high reflectivity at grazing incidence for EUV radiation (13.5) are proposed as coatings for the collection mirror in an EUVL system. These films were deposited on different substrates (Si, glass, and different metals) by d.c. magnetron sputtering and characterized by XRD, AES, EDX, AFM and EUV reflectivity using synchrotron radiation.

Keywords

Auger electron spectra; X-ray chemical analysis; X-ray diffraction; atomic force microscopy; elemental semiconductors; glass; multilayers; reflectivity; silicon; sputter deposition; titanium compounds; ultraviolet lithography; zirconium compounds; AES; AFM; EDX; EUV lithography; Si; XRD; ZrN-TiN; ZrN/TiN multilayered coatings; d.c. magnetron sputtering; glass; grazing incidence mirrors; reflectivity; silicon; synchrotron radiation; Coatings; Glass; Lithography; Mirrors; Optical films; Reflectivity; Semiconductor films; Sputtering; Tin; X-ray scattering; EUV lithography; Microchemical and optical properties; Multilayered coatings; ZrN/TiN;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Conference, 2008. CAS 2008. International

Conference_Location

Sinaia

ISSN

1545-827X

Print_ISBN

978-1-4244-2004-9

Type

conf

DOI

10.1109/SMICND.2008.4703399

Filename

4703399