Title :
Grazing incidence mirrors for EUV lithography
Author :
Braic, V. ; Balaceanu, M. ; Braic, M.
Author_Institution :
Nat. Inst. for Optoelectron., Bucharest
Abstract :
Extreme UV lithography is one of the most favoured options for the next generation of lithography systems, being considered as one of the keys of the 50 nm technology node. ZrN/TiN, multi-layered coatings for mirrors with high reflectivity at grazing incidence for EUV radiation (13.5) are proposed as coatings for the collection mirror in an EUVL system. These films were deposited on different substrates (Si, glass, and different metals) by d.c. magnetron sputtering and characterized by XRD, AES, EDX, AFM and EUV reflectivity using synchrotron radiation.
Keywords :
Auger electron spectra; X-ray chemical analysis; X-ray diffraction; atomic force microscopy; elemental semiconductors; glass; multilayers; reflectivity; silicon; sputter deposition; titanium compounds; ultraviolet lithography; zirconium compounds; AES; AFM; EDX; EUV lithography; Si; XRD; ZrN-TiN; ZrN/TiN multilayered coatings; d.c. magnetron sputtering; glass; grazing incidence mirrors; reflectivity; silicon; synchrotron radiation; Coatings; Glass; Lithography; Mirrors; Optical films; Reflectivity; Semiconductor films; Sputtering; Tin; X-ray scattering; EUV lithography; Microchemical and optical properties; Multilayered coatings; ZrN/TiN;
Conference_Titel :
Semiconductor Conference, 2008. CAS 2008. International
Conference_Location :
Sinaia
Print_ISBN :
978-1-4244-2004-9
DOI :
10.1109/SMICND.2008.4703399
