DocumentCode
1822074
Title
Phase contrast image segmentation by weak watershed transform assembly
Author
Debeir, Olivier ; Adanja, I. ; Warzee, Nadine ; Van Ham, P. ; Decaestecker, Christine
Author_Institution
Lab. of Image Synthesis & Anal., Univ. Libre de Bruxelles, Brussels
fYear
2008
fDate
14-17 May 2008
Firstpage
724
Lastpage
727
Abstract
We present here a method giving a robust segmentation for in vitro cells observed under standard phase-contrast microscopy. We tackle the problem using the watershed transform. Watershed transform is known for its ability to generate closed contours and its extreme sensitivity to image borders. One main drawback of this method is over- segmentation. In order to circumvent this, marked watershed based on the "modified gradient" method has been developed. However, the choice of the watershed mark locations is critical and their inadequacy may cause wrong results. Similarly to randomization and combination procedures used in the machine learning field, the present paper promotes the use of an assembly of marked watershed transforms, in order to increase the segmentation robustness. This results in the definition of candidate segmentations margins (expressed in terms of object border confidence) from which final segmentation can be chosen by means of thresholding.
Keywords
cellular biophysics; image segmentation; mathematical morphology; medical image processing; pattern classification; in vitro cells; machine learning field; marked watershed transform; modified gradient method; phase contrast image segmentation; phase-contrast microscopy; segmentation robustness; watershed mark location; weak watershed transform assembly; Assembly; Image generation; Image segmentation; In vitro; Laboratories; Machine learning; Microscopy; Morphology; Pixel; Robustness; Classifier assembly; Image segmentation; Mathematical morphology; Medical image processing; Pattern classification;
fLanguage
English
Publisher
ieee
Conference_Titel
Biomedical Imaging: From Nano to Macro, 2008. ISBI 2008. 5th IEEE International Symposium on
Conference_Location
Paris
Print_ISBN
978-1-4244-2002-5
Electronic_ISBN
978-1-4244-2003-2
Type
conf
DOI
10.1109/ISBI.2008.4541098
Filename
4541098
Link To Document