DocumentCode :
1824497
Title :
Machine model evaluation and interconnect effect study for TMR HGA
Author :
Bai, Wei ; Teng, ZhaoYu ; Liu, Ryan ; Li, William ; Wong, MinBing ; Chou, Sidney
Author_Institution :
SAE Technol. Dev. Co. Ltd., Dongguan, China
fYear :
2011
fDate :
11-16 Sept. 2011
Firstpage :
1
Lastpage :
6
Abstract :
This paper presents Machine Model (MM) discharge to TMR HGA in different ways, including stressing between the two read pads, and between one read pad and ground. The breakdown voltage is 0.89 V and 6.0 V respectively. The discharge voltage at the TMR sensor in MM stress test is measured and simulated for each case. The discharge voltage at the TMR sensor is inversely proportional to the interconnect window percentage in the later case. Increasing the window percentage in the reference plane can effectively improve threshold voltage of the TMR sensor when MM stressing between one read pad and ground.
Keywords :
discharges (electric); magnetoresistance; MM stress test; TMR HGA; breakdown voltage; discharge voltage; interconnect effect; machine model discharge; machine model evaluation; read pads; tunnel magnetoresistance; voltage 0.89 V; voltage 6.0 V; Discharges; Electrostatic discharge; Integrated circuit interconnections; Integrated circuit modeling; Suspensions; Tunneling magnetoresistance; Voltage measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electrical Overstress/Electrostatic Discharge Symposium (EOS/ESD), 2011 33rd
Conference_Location :
Anaheim, CA
ISSN :
Pending
Electronic_ISBN :
Pending
Type :
conf
Filename :
6045608
Link To Document :
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