• DocumentCode
    1824497
  • Title

    Machine model evaluation and interconnect effect study for TMR HGA

  • Author

    Bai, Wei ; Teng, ZhaoYu ; Liu, Ryan ; Li, William ; Wong, MinBing ; Chou, Sidney

  • Author_Institution
    SAE Technol. Dev. Co. Ltd., Dongguan, China
  • fYear
    2011
  • fDate
    11-16 Sept. 2011
  • Firstpage
    1
  • Lastpage
    6
  • Abstract
    This paper presents Machine Model (MM) discharge to TMR HGA in different ways, including stressing between the two read pads, and between one read pad and ground. The breakdown voltage is 0.89 V and 6.0 V respectively. The discharge voltage at the TMR sensor in MM stress test is measured and simulated for each case. The discharge voltage at the TMR sensor is inversely proportional to the interconnect window percentage in the later case. Increasing the window percentage in the reference plane can effectively improve threshold voltage of the TMR sensor when MM stressing between one read pad and ground.
  • Keywords
    discharges (electric); magnetoresistance; MM stress test; TMR HGA; breakdown voltage; discharge voltage; interconnect effect; machine model discharge; machine model evaluation; read pads; tunnel magnetoresistance; voltage 0.89 V; voltage 6.0 V; Discharges; Electrostatic discharge; Integrated circuit interconnections; Integrated circuit modeling; Suspensions; Tunneling magnetoresistance; Voltage measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electrical Overstress/Electrostatic Discharge Symposium (EOS/ESD), 2011 33rd
  • Conference_Location
    Anaheim, CA
  • ISSN
    Pending
  • Electronic_ISBN
    Pending
  • Type

    conf

  • Filename
    6045608